SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Optical/Laser Microlithography III - Advances in deep-UV lithographyOlson, Setha G.SPIE1990DOI 10.1117/12.20204
SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Optical/Laser Microlithography III - High-numerical-aperture I-line stepperKatz, Barton A.SPIE1990DOI 10.1117/12.20183
SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Optical/Laser Microlithography III - Photolithography simulation on nonplanar substratesYeung, Michael S.SPIE1990DOI 10.1117/12.20196
SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Optical/Laser Microlithography III - Microcircuit lithography using holographic imagingChen, Ray T.Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE1990DOI 10.1117/12.20199
SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Optical/Laser Microlithography III - Recent advances in prepellicle mask cleaningPlambeck, Bert F.Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE1990DOI 10.1117/12.20224
SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Optical/Laser Microlithography III - Simulation of scattering effects in photolithographyTol, A. J. W.SPIE1990DOI 10.1117/12.20223
SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Microlithography using conducting polymersBargon, JoachimProceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE1990DOI 10.1117/12.20109
SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Integrated Circuit Metrology, Inspection, and Process Control IV - Exposure monitor structureStarikov, AlexanderSPIE1990DOI 10.1117/12.20057
SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Integrated Circuit Metrology, Inspection, and Process Control IV - Automated lithocellEnglisch, AndreasSPIE1990DOI 10.1117/12.20054
SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Optical/Laser Microlithography III - Dry etching for high-resolution maskmakingTedesco, Serge V.SPIE1990DOI 10.1117/12.20185
SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Optical/Laser Microlithography III - Chip leveling and focusing with laser interferometryOshida, YoshitadaProceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE1990DOI 10.1117/12.20192
SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Integrated Circuit Metrology, Inspection, and Process Control IV - Practical photomask linewidth measurementsPotzick, James E.SPIE1990DOI 10.1117/12.20039