About this scholarly article

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Integrated Circuit Metrology, Inspection, and Process Control IV - Practical photomask linewidth measurements by Potzick, James E.; Arnold, William H. is a scholarly article available to read on EtoBox.

Author

Potzick, James E.; Arnold, William H.

Publisher

SPIE

Published

1990

Language

EN