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End-user Development : Third International Symposium, Is-eud 2011, Torre Canne (br), Italy, June 7-10, 2011 : Proceedings(auth.) et al. · Lecture Notes in Computer Science2011PDF11 MB
23rd Annual BACUS Symposium on Photomask Technology: 9-12 September, 2003, Monterey, California, USAKurt R. Kimmel, Wolfgang Staud, chairs/editors2003PDF58 MBEN
Photomask and Next-generation Lithography Mask Technology X: 16-18 April, 2003, Yokohama, JapanHiroyoshi Tanabe2003PDF15 MBEN
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Photomask and Next-generation Lithpgraphy Mask Technology (proceedings of Spie Volume 5446) Part One & TwoHiroyoshi Tanabe, editor2004PDF40 MBEN