Photomask and X-ray mask technology V: 9-10 April, 1998, Kawasaki, JapanNaoaki Aizaki, editor & 6 more1998PDF45 MB
Photomask and X-ray mask technology VI: 13-14 April, 1999, Yokohama, JapanHiraoki Morimoto, editor & 5 more1999PDF46 MB
22nd Annual BACUS Symposium on Photomask Technology: 1-4 October, 2002, Monterey, California, USABrian J. Grenon, Kurt R. Kimmel & 4 more2002PDF58 MB
19th Annual Bacus Symposium on Photomask Technology and Management 15-17 September 1999 Mont...Frank E. Abboud, Brian J. Grenon & 2 more1999PDF41 MB
Photomask and next-generation lithography mask technology VIII: 25-26 April 2001, Yokohama, JapanHiroichi Kawahira, editor & 6 more2001PDF55 MB
A New Visible Light Triggered Arrhenius Photobase and Its Photo-induced ReactionsJoonyoung F. Joung & Jeeun Lee & Joungin Hwang & Kihang Choi & Sungnam ParkPDF4.1 MBEN
21st Annual BACUS Symposium on Photomask Technology: 3-5 October, 2001 Monterey, USAGiang T. Dao, Brian J. Grenon & 4 more2002PDF40 MBEN
11th annual Symposium on Photomask Technologysponsored by Bacus--the International Technical Group of Spie dedicated to the advancement of photomask technology1992PDF20 MBEN
23rd Annual BACUS Symposium on Photomask Technology: 9-12 September, 2003, Monterey, California, USAKurt R. Kimmel, Wolfgang Staud & 2 more2003PDF58 MBEN
Photomask and next-generation lithography mask technology X: 16-18 April, 2003, Yokohama, JapanHiroyoshi Tanabe, Photomask Japan & 5 more2003PDF15 MBEN
24th Annual BACUS Symposium on Photomask Technology: 14-17 September, 2004, Monterey, California, USAWolfgang Staud, J. Tracy Weed & 3 more2004PDF64 MBEN
Fotocollecties beheren en afdrukken met ArcSoft PhotoBase en PhotoPrinter / druk 1Addo Stuur, red.: Marleen Vermeij ... et al., eindred.: Ria Beentjes2004PDF22 MBNL
Photomask and Next-generation Lithography Mask Technology VIIHiroaki i.e. Hiraoki Morimoto, editor & 9 more2000PDF54 MBEN