Photomask Fabrication Technology (Professional Engineering)Benjamin G.Eynon, Jr. & 3 more2005PDF · 5.3 MBEN
Festivals (photopack Series) (photopack Series)Peta Cato, Corinne McCulloch, Rosie Washford Murphy1994PDF · 5.6 MBEN
Aztecs (photopack Series) (photopack Series) (primary Photopacks)Steve Harrison, Jonathan Hewitt, Folens Limited1997PDF · 3.4 MBEN
The Home Front (photopack Series) (photopack Series) (primary Photopacks)Tony D. Triggs1995PDF · 4.5 MBEN
Photomask and X-ray mask technology V : 9-10 April, 1998, Kawasaki, JapanNaoaki Aizaki, editor & 6 more1998PDF · 45 MBEN
22nd Annual BACUS Symposium on Photomask Technology : 1-4 October, 2002, Monterey, California, USABrian J. Grenon, Kurt R. Kimmel & 4 more2002PDF · 58 MBEN
19th Annual Bacus Symposium on Photomask Technology and Management 15-17 September 1999 Mont...Frank E. Abboud, Brian J. Grenon & 2 more1999PDF · 41 MBEN
Photomask and next-generation lithography mask technology VIII : 25-26 April 2001, Yokohama, JapanHiroichi Kawahira, editor & 6 more2001PDF · 55 MBEN
Photomask and X-ray mask technology VI : 13-14 April, 1999, Yokohama, JapanHiraoki Morimoto, editor & 5 more1999PDF · 46 MBEN
21st Annual BACUS Symposium on Photomask Technology : 3-5 October, 2001 Monterey, [California] USAGiang T. Dao, Brian J. Grenon & 4 more2002PDF · 40 MBEN
11th annual Symposium on Photomask Technology : proceedings : September 25-27, 1991, Sunnyvale, Californiasponsored by Bacus--the International Technical Group of Spie dedicated to the advancement of photomask technology1992PDF · 20 MBEN
23rd Annual BACUS Symposium on Photomask Technology : 9-12 September, 2003, Monterey, California, USAKurt R. Kimmel, Wolfgang Staud & 2 more2003PDF · 58 MBEN
Photomask and next-generation lithography mask technology X : 16-18 April, 2003, Yokohama, JapanHiroyoshi Tanabe, Photomask Japan & 5 more2003PDF · 15 MBEN
24th Annual BACUS Symposium on Photomask Technology : 14-17 September, 2004, Monterey, California, USAWolfgang Staud, J. Tracy Weed & 3 more2004PDF · 64 MBEN
Photomask and Next-generation Lithography Mask Technology VII : [contains the Invited and Contributed Papers Presented at Photomask Japan 2000], 12-13 April 2000, Yokohama, JapanHiroaki i.e. Hiraoki Morimoto, editor & 9 more2000PDF · 54 MBEN