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Chemical Vapour Deposition - Precursors, Processes and Applications by Jones, Anthony C.; Hitchman, Michael L.(eds.) is a science book available to read on EtoBox.
What is Chemical Vapour Deposition - Precursors, Processes and Applications about?
Chemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical precursors in the vapour phase, and encompasses a variety of deposition techniques, including a range of thermal processes, plasma enhanced CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD). The development of CVD technology owes a great deal to collaboration between different scientific disciplines such as chemistry, physics, materials science, engineering and microelectronics, and the
Who reads Chemical Vapour Deposition - Precursors, Processes and Applications?
It is typically read by self-directed learners exploring a subject in depth.
Common subject areas: history, science, philosophy, social sciences.
- Author
- Jones, Anthony C.; Hitchman, Michael L.(eds.)
- Publisher
- Royal Society of Chemistry
- Published
- 2009
- Language
- EN
- ISBN
- 9781847558794
- Category
- science
- Subjects
- Engineering, Technology, Chemistry
- Updated
- 2026-03-25
Other editions & translations
- Select Thermodynamic Models for Process Simulation - A Practical Guide Using a Three Steps Methodology (2012)
- Получение ультрачистого водорода с использованием интегрированного мембранного реактора: учебное пособие (2017)
- Chemical Vapour Deposition: Precursors, Processes and Applications Edition (2008)
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