Can I read Ionized Physical Vapor Deposition (Volume 27) (Thin Films, Volume 27) on EtoBox?

Ionized Physical Vapor Deposition (Volume 27) (Thin Films, Volume 27) by Ronald Powell, Abraham Ulman is a nonfiction available to read on EtoBox.

What is Ionized Physical Vapor Deposition (Volume 27) (Thin Films, Volume 27) about?

This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips.For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur i

Who reads Ionized Physical Vapor Deposition (Volume 27) (Thin Films, Volume 27)?

Author

Ronald Powell, Abraham Ulman

Publisher

Academic Press, Incorporated

Published

1999

Language

EN

ISBN

9786611054342

Category

nonfiction

Subjects

Science, Technology, Engineering