About this scholarly article

SPIE Proceedings [SPIE 18th Annual BACUS Symposium on Photomask Technology and Management - Redwood City, CA (Wednesday 16 September 1998)] 18th Annual BACUS Symposium on Photomask Technology and Management - Size matters: defect detectability in reticle and wafer inspection including advanced aerial image simulation for defect printability by Almog, Eli; Caldwell, Roger F.; Chang, Fang C.; Chen, J. Fung; Farrar, Nigel R.; Karklin, Linard; Laidig, Thomas L.; Sabouri, Saeed; Shen, Wayne P.; Staud, Wolfgang; Wu, Clive; Zelenko, Jeremy; Grenon, Brian J.; Abboud, Frank E. is a scholarly article available to read on EtoBox.

Author

Almog, Eli; Caldwell, Roger F.; Chang, Fang C.; Chen, J. Fung; Farrar, Nigel R.; Karklin, Linard; Laidig, Thomas L.; Sabouri, Saeed; Shen, Wayne P.; Staud, Wolfgang; Wu, Clive; Zelenko, Jeremy; Grenon, Brian J.; Abboud, Frank E.

Publisher

SPIE

Published

1998