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About this Engineering article
RELY: A physics-based CAD tool for predicting time-dependent hot-electron induced degradation in MOSFET's by Shiuh-Luen Wang; Neil Goldsman; Qi Lin; Jeffrey Frey is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Shiuh-Luen Wang; Neil Goldsman; Qi Lin; Jeffrey Frey
- Publisher
- Elsevier Science; Elsevier ; Elsevier Ltd.; Elsevier BV (ISSN 0038-1101)
- Published
- 1993
- Field
- Engineering (Physical Sciences)
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