Opening book details…
About this Engineering article
Gate Oxide Process Control Optimization by X-ray Photoelectron Spectroscopy in a Semiconductor Fabrication Line by Le Gouil, A.; Cabuil, N.; Dupeyrat, P.; Dickson, B.; Kwan, M.; Barge, D.; Gurer, E.; Doclot, O.; Royer, J.-C. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Le Gouil, A.; Cabuil, N.; Dupeyrat, P.; Dickson, B.; Kwan, M.; Barge, D.; Gurer, E.; Doclot, O.; Royer, J.-C.
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-2101)
- Published
- 2008
- Language
- EN
- Field
- Engineering (Physical Sciences)