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Determination of Thickness and Composition of Aluminium-oxide Overlayers on Aluminium Substrates by L.P.H Jeurgens; W.G Sloof; F.D Tichelaar; C.G Borsboom; E.J Mittemeijer is a scholarly article available to read on EtoBox.

A novel method is presented to determine the thickness and the composition of oxide films on metal substrates using the measured XPS spectra of the clean and the oxidised metal. The method is applied to aluminium-oxide films on aluminium substrates. The oxide-film thickness is derived from the primary zero-loss intensities of only the metallic and oxidic Al 2 p main peaks, utilising the known value of the intrinsic bulk plasmon excitation probability for the Al 2 p core-level photoelectron emission process. It is shown that this new method for layer-thickness determination gives results that can differ 20% from results obtained by the less correct methods used in common practice. The actual composition, expressed as the OrAl atomic ratio, of the oxide film is determined from the total primary zero-loss intensities of the O 1 s peak and the Al 2 p peak of Al 2 p oxidic rest spectrum. This spectrum of the oxide is obtained after subtraction of a reconstructed metallic Al 2 p peak from the measured XPS spectrum.

Author

L.P.H Jeurgens; W.G Sloof; F.D Tichelaar; C.G Borsboom; E.J Mittemeijer

Publisher

Elsevier Science; Elsevier ; Elsevier BV (ISSN 0169-4332)

Published

1999

Language

EN