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About this Engineering article
Control of temperature coefficient of resistance by reactive sputtering of tantalum with nitrogen and oxygen simultaneously : G. I. Parisi, Proc. 1969 Electron. Compon. Conf., Washington D.C., 30 April–2 May (1969), p. 367 is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0026-2714)
- Published
- 1969
- Field
- Engineering (Physical Sciences)