About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Alternative Lithographic Technologies VIII - Experiments toward establishing of design rules for R2R-UV-NIL with polymer working shims by Bencher, Christopher; Cheng, Joy Y.; Nees, Dieter; Ruttloff, Stephan; Palfinger, Ursula; Stadlober, Barbara is a scholarly article available to read on EtoBox.

Author

Bencher, Christopher; Cheng, Joy Y.; Nees, Dieter; Ruttloff, Stephan; Palfinger, Ursula; Stadlober, Barbara

Publisher

SPIE

Published

2016

Language

EN