Can I read Nano-Scale Residual Stress Profiling in Thin Multilayer Films with Non-Equibiaxial Stress State on EtoBox?

Nano-Scale Residual Stress Profiling in Thin Multilayer Films with Non-Equibiaxial Stress State by Sebastiani, Marco; Rossi, Edoardo; Zeeshan Mughal, Muhammad; Benedetto, Alessandro; Jacquet, Paul; Salvati, Enrico; Korsunsky, Alexander M. is a scholarly article available to read on EtoBox.

What is Nano-Scale Residual Stress Profiling in Thin Multilayer Films with Non-Equibiaxial Stress State about?

Silver-based low-emissivity (low-E) coatings are applied on architectural glazing to cost-effectively reduce heat losses, as they generally consist of dielectric/Ag/dielectric multilayer stacks, where the thin Ag layer reflects long- wavelength infrared (IR), while the dielectric layers both protect the Ag and act as an anti-reflective barrier. The architecture of the multilayer stack influences its mechanical properties and it is strongly dependent on the residual stress distribution in the stack. Residual stress evaluation by combining focused ion beam (FIB) milling and digital image correlation (DIC), using the micro-ring core configuration (FIB-DIC), offers micron-scale lateral resolution and provides information about the residual stress variation with depth, i.e., it allows depth profiling for both equibiaxial and non-equibiaxial stress distributions and hence can be effectively used to characterize low-E coatings. In this work, we propose an innovative approach to improve the depth resolution and surface sensitivity for residual stress depth profiling in the case of ultra-thin as-deposited and post-deposition annealed Si3N4/Ag/ZnO low-E coatings, by considering different fra

Author

Sebastiani, Marco; Rossi, Edoardo; Zeeshan Mughal, Muhammad; Benedetto, Alessandro; Jacquet, Paul; Salvati, Enrico; Korsunsky, Alexander M.

Publisher

MDPI AG; Multidisciplinary Digital Publishing Institute (MDPI); Basel: MDPI AG, 2011- (ISSN 2079-4991)

Published

2020

Language

EN