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About this Engineering article
Copper diffusion characteristics in single-crystal and polycrystalline TaN by H. Wang; A. Tiwari; X. Zhang; A. Kvit; J. Narayan is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- H. Wang; A. Tiwari; X. Zhang; A. Kvit; J. Narayan
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 2002
- Field
- Engineering (Physical Sciences)
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