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About this Engineering article
Fabrication of Tm-doped Ta2O5 thin films using a co-sputtering method by Miura, K.; Osawa, T.; Yokota, Y.; Suzuki, T.; Hanaizumi, O. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Miura, K.; Osawa, T.; Yokota, Y.; Suzuki, T.; Hanaizumi, O.
- Publisher
- Elsevier ; Elsevier BV; Amsterdam: Elsevier (ISSN 2211-3797)
- Published
- 2014
- Field
- Engineering (Physical Sciences)
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