About this scholarly article

Lithographic properties of amorphous WO3 films exposed to photons, electrons, and hydrogen plasma: P K Gupta and K L Chopra, J appl Phys, 62, 1987, 4273–4276 is a scholarly article available to read on EtoBox.

Publisher

Elsevier Science; Elsevier ; Elsevier Ltd.; Elsevier BV (ISSN 0042-207X)

Published

1989

Language

EN