About this scholarly article

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Correction of the phase retardation caused by intrinsic birefringence in deep UV lithography by Serebriakov, Alexander; Smith, Bruce W.; Bociort, Florian; Braat, Joseph is a scholarly article available to read on EtoBox.

Author

Serebriakov, Alexander; Smith, Bruce W.; Bociort, Florian; Braat, Joseph

Publisher

SPIE

Published

2005

Language

EN