About this Materials Science article
Thermal boundary resistance correlated with strain energy in individual Si film-wafer twist boundaries by Xu, D.; Hanus, R.; Xiao, Y.; Wang, S.; Snyder, G.J.; Hao, Q. is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Xu, D.; Hanus, R.; Xiao, Y.; Wang, S.; Snyder, G.J.; Hao, Q.
- Publisher
- Elsevier ; Elsevier Ltd; Elsevier BV (ISSN 2542-5293)
- Published
- 2018
- Language
- EN
- Field
- Materials Science (Physical Sciences)