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A Plasma Process Monitor/control System by Stevenson, Joel O.; Ward, Pamela P.; Smith, Michael L.; Markle, Richard J. is a Engineering article available to read on EtoBox.

What is A Plasma Process Monitor/control System about?

Sandia National Laboratories has developed a system to monitor plasma processes for the control of industrial applications. The system is designed to act as a fully automated, stand-alone process monitor during printed wiring board and semiconductor production runs. The monitor routinely performs data collection, analysis, process identi-Ðcation and error detection/correction without the need for human intervention. The monitor can also be used in research mode to allow process engineers to gather additional information about plasma processes. Because plasma processes have wide application in thin-Ðlm growth, the monitor could also be used to better understand and control myriad thin-Ðlm manufacturing processes. Surface interactions, thin-Ðlm interfaces, growth and stoichiometry are potential areas of impact. The plasma process monitor/control system consists of a computer running software developed by Sandia National Laboratories, a commercially available spectrophotometer equipped with a charge-coupled device camera, an input/output device and a Ðber-optic cable. The tool is designed to be a versatile, multipurpose piece of equipment allowing automated process veriÐcation and err

Who reads A Plasma Process Monitor/control System?

Author

Stevenson, Joel O.; Ward, Pamela P.; Smith, Michael L.; Markle, Richard J.

Publisher

John Wiley and Sons; Wiley (John Wiley & Sons); John Wiley & Sons Inc.; Wiley; Research Square (ISSN 0142-2421)

Published

1998

Language

EN

Field

Engineering (Physical Sciences)