Opening book details…
About this Engineering article
Formation of WxSi1−x by plasma chemical vapor deposition by Akimoto, K. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Akimoto, K.
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 1981
- Language
- EN
- Field
- Engineering (Physical Sciences)