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About this Engineering article
Spatial Distribution of Plasma Parameters in Microwave Plasma Chemical Vapor Deposition by Kato, Isamu; Usui, Takashi; Sakamoto, Tadashi is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Kato, Isamu; Usui, Takashi; Sakamoto, Tadashi
- Publisher
- Japan Science and Technology Information Aggregator, Electronic; Institute Electrical Engineers Japan; The Institute of Electrical Engineers of Japan; Institute of Electrical Engineers of Japan (IEE Japan) (ISSN 0385-4205)
- Published
- 1992
- Field
- Engineering (Physical Sciences)
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