About this scholarly article

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Optical Microlithography XI - 0.18-μm optical lithography performances using an alternating DUV phase-shift mask by Trouiller, Yorick; Buffet, N.; Mourier, Thierry; Schiavone, Patrick; Quere, Yves; Van den Hove, Luc is a scholarly article available to read on EtoBox.

Author

Trouiller, Yorick; Buffet, N.; Mourier, Thierry; Schiavone, Patrick; Quere, Yves; Van den Hove, Luc

Publisher

SPIE

Published

1998

Language

EN