About this scholarly article

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Controlled developing time for higher-resolution i-line photoresist by Saito, Yutaka; Yamada, Tatsuya; Itoh, Kunio; Conley, Will is a scholarly article available to read on EtoBox.

Author

Saito, Yutaka; Yamada, Tatsuya; Itoh, Kunio; Conley, Will

Publisher

SPIE

Published

1999