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International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138) - A novel bit-line process using poly-Si masked dual-damascene (PMDD) for 0.13 μm DRAMs and beyond by Miyashita, T.; Nitta, H.; Nomura, H.; Nakajima, K.; Sakata, A.; Mizutani, T.; Minakata, H.; Tanaka, M.; Tomita, H.; Kurahashi, T.; Watanabe, Y.; Kubota, T.; Hatada, A.; Hosaka, K.; Hashimoto, K.; Kohyama, Y. is a scholarly article available to read on EtoBox.

Author
Miyashita, T.; Nitta, H.; Nomura, H.; Nakajima, K.; Sakata, A.; Mizutani, T.; Minakata, H.; Tanaka, M.; Tomita, H.; Kurahashi, T.; Watanabe, Y.; Kubota, T.; Hatada, A.; Hosaka, K.; Hashimoto, K.; Kohyama, Y.
Publisher
IEEE
Published
2000
Language
EN

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