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About this Engineering article

Reduced Perssure-Chemical Vapor Deposition of High Quality Ge Layers on SiGe/Si Superlayers for Microelectronics and Optoelectronics Purposes by Chen Da; Xue Zhongying; Liu Su; Miao Zhang is a Engineering article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Engineering.

Author
Chen Da; Xue Zhongying; Liu Su; Miao Zhang
Publisher
The Electrochemical Society (ISSN 2151-2043)
Published
2012
Language
EN
Field
Engineering (Physical Sciences)

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