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About this Engineering article
Interface Reactions of B[sub 2]O[sub 3]-Si System and Boron Diffusion into Silicon by Arai, E.; Nakamura, H.; Terunuma, Y. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Arai, E.; Nakamura, H.; Terunuma, Y.
- Publisher
- The Electrochemical Society; Electrochemical Society, Inc. (ISSN 0013-4651)
- Published
- 1973
- Field
- Engineering (Physical Sciences)