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About this Engineering article
Low interface resistance and excellent anti-oxidation of Al/Cu/Ni multilayer thin-film electrodes for Bi 2 Te 3 -based modules by Zhou, Hongyu; Mu, Xin; Zhao, Wenyu; Tang, Dingguo; Wei, Ping; Zhu, Wanting; Nie, Xiaolei; Zhang, Qingjie is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Zhou, Hongyu; Mu, Xin; Zhao, Wenyu; Tang, Dingguo; Wei, Ping; Zhu, Wanting; Nie, Xiaolei; Zhang, Qingjie
- Publisher
- Elsevier ; Elsevier BV (ISSN 2211-2855)
- Published
- 2017
- Language
- EN
- Field
- Engineering (Physical Sciences)