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About this Engineering article
Conformal Al[sub 2]O[sub 3] dielectric layer deposited by atomic layer deposition for graphene-based nanoelectronics by Lee, Bongki; Park, Seong-Yong; Kim, Hyun-Chul; Cho, KyeongJae; Vogel, Eric M.; Kim, Moon J.; Wallace, Robert M.; Kim, Jiyoung is a Engineering article available to read on EtoBox.
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- Author
- Lee, Bongki; Park, Seong-Yong; Kim, Hyun-Chul; Cho, KyeongJae; Vogel, Eric M.; Kim, Moon J.; Wallace, Robert M.; Kim, Jiyoung
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 2008
- Language
- EN
- Field
- Engineering (Physical Sciences)