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About this Engineering article
Growth, selectivity and adhesion of CVD-deposited copper from Cu+1 (hexafluoroacetylacetonate trimethylvinylsilane) and dichlorodimethylsilane by James B. Webb; Daniel Northcott; Ismail Emesh is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- James B. Webb; Daniel Northcott; Ismail Emesh
- Publisher
- Elsevier Science; Elsevier ; Elsevier Sequoia; Elsevier BV (ISSN 0040-6090)
- Published
- 1995
- Language
- EN
- Field
- Engineering (Physical Sciences)
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