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About this Engineering article
Effect of ion implantation on the oxidation resistance of TiAl by M. Yoshihara; S. Taniguchi; Y. -C. Zhu is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- M. Yoshihara; S. Taniguchi; Y. -C. Zhu
- Publisher
- The Minerals, Metals & Materials Society; Springer-Verlag; Springer Boston; Springer Science and Business Media LLC (ISSN 1073-5623)
- Published
- 2003
- Language
- EN
- Field
- Engineering (Physical Sciences)