About this scholarly article

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference - 0.32 μm pitch on-gird random line pattern formation by dense dummy pattern and double exposure in KrF wavelength by Nakao, S.; Tsujita, K.; Arimoto, I.; Wakamiya, W. is a scholarly article available to read on EtoBox.

Author

Nakao, S.; Tsujita, K.; Arimoto, I.; Wakamiya, W.

Publisher

Japan Society of Applied Physics

Published

1999

Language

EN