About this scholarly article

SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - Inspectability and printability of lines and spaces halftone masks for the advanced DRAM node by Dürr, Arndt C.; Martin, Patrick M.; Naber, Robert J.; Gutjahr, Karsten; Heumann, Jan; Stengl, Martin; Katzwinkel, Frank; Frangen, Andreas; Witte, Thomas is a scholarly article available to read on EtoBox.

Author

Dürr, Arndt C.; Martin, Patrick M.; Naber, Robert J.; Gutjahr, Karsten; Heumann, Jan; Stengl, Martin; Katzwinkel, Frank; Frangen, Andreas; Witte, Thomas

Publisher

SPIE

Published

2006