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About this Engineering article
Electron-beam resists for lift-off processing with potential application to Josephson integrated circuits: J. H. Magerlein and D. J. Webb. IBM J. Res. Devel. 24 (5), 554 (September 1980) is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0026-2714)
- Published
- 1981
- Field
- Engineering (Physical Sciences)