About this scholarly article

2006 8th International Conference on Solid-State and Integrated Circuit Technology Proceedings - High-per formance, highly reliable HfSiON gate dielectric for low Vth system LSI's by Yugami, J.; Inoue, M.; Tsujikawa, S.; Mizutani, M.; Nomura, K.; Hayashi, T.; Nishida, Y.; Shiga, K.; Tsuchimoto, J.; Ohno, Y.; Yoneda, M. is a scholarly article available to read on EtoBox.

Author

Yugami, J.; Inoue, M.; Tsujikawa, S.; Mizutani, M.; Nomura, K.; Hayashi, T.; Nishida, Y.; Shiga, K.; Tsuchimoto, J.; Ohno, Y.; Yoneda, M.

Publisher

IEEE

Published

2006

Language

EN