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Growth and electrical properties of AlxGa1−xN/GaN heterostructures with different Al-content by K. Köhler; S. Müller; P. Waltereit; L. Kirste; H. P. Menner; W. Bronner; R. Quay is a Materials Science article available to read on EtoBox.

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## Abstract High electron mobility transistor material and device properties based on Al~__x__~Ga~1−__x__~N/GaN heterostructures with an Al‐content ranging from 12 to 35% are presented. The Al‐content of the low pressure metal‐organic vapor‐phase epitaxy grown samples on semi‐insulating SiC and sapphire was measured by high resolution X‐ray diffraction; carrier concentration and mobility by Hall effect. The sheet carrier density in the nominally undoped structures increases with the Al‐content from 3.6 × 10^12^ to 1.4 × 10^13^ cm^−2^ due to spontaneous and piezoelectric polarization. Comparison of the electrical data with a model based on polarization and strain induced effects in dependence of the Al‐composition shows good agreement. Further discussion and presentation on devices is restricted to data on SiC substrates. We quantitatively relate threshold voltage and extrinsic transconductance of FETs to the carrier concentration und thus to the Al‐content in the barrier. Excellent large signal performance is achieved over the Al~__x__~Ga~1−__x__~N‐composition range from 14 to 30%.

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Author
K. Köhler; S. Müller; P. Waltereit; L. Kirste; H. P. Menner; W. Bronner; R. Quay
Publisher
John Wiley and Sons; Wiley (John Wiley & Sons); John Wiley & Sons Ltd.; Wiley; Wiley - V C H Verlag GmbbH & Co. (ISSN 0031-8965)
Published
2009
Language
EN
Field
Materials Science (Physical Sciences)

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