About this scholarly article

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Wafer topography proximity effect modeling and correction for implant layer patterning by Song, Hua; Zurbrick, Larry S.; Montgomery, M. Warren; Shiely, James; Su, Irene; Zhang, Lin; Lei, Wen-Kang is a scholarly article available to read on EtoBox.

Author

Song, Hua; Zurbrick, Larry S.; Montgomery, M. Warren; Shiely, James; Su, Irene; Zhang, Lin; Lei, Wen-Kang

Publisher

SPIE

Published

2009

Language

EN