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About this Engineering article
Growth Mechanism of Thin Insulating Layer in Ferromagnetic Tunnel Junctions Prepared Using Various Oxidation Methods by Ando, Y; Hayashi, M; Iura, S; Yaoita, K; Yu, C C; Kubota, H; Miyazaki, T is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Ando, Y; Hayashi, M; Iura, S; Yaoita, K; Yu, C C; Kubota, H; Miyazaki, T
- Publisher
- Institute of Physics; IOP Publishing; Institute of Physics Publishing (ISSN 0022-3727)
- Published
- 2002
- Language
- EN
- Field
- Engineering (Physical Sciences)
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