Opening book details…
About this Engineering article
Evaluation of NBTI in$hbox HfO_2$Gate-Dielectric Stacks With Tungsten Gates by Zafar, S.; Lee, B.H.; Stathis, J. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Zafar, S.; Lee, B.H.; Stathis, J.
- Publisher
- IEEE; Institute of Electrical and Electronics Engineers; Institute of Electrical and Electronics Engineers (IEEE) (ISSN 0741-3106)
- Published
- 2004
- Language
- EN
- Field
- Engineering (Physical Sciences)