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About this Engineering article
Effect of rapid thermal annealing on optical and interfacial properties of atomic-layer-deposited Lu2O3 films on Si by Lu, H. L. ;Scarel, G. ;Lamagna, L. ;Fanciulli, M. ;Ding, Shi-Jin ;Zhang, David Wei is a Engineering article available to read on EtoBox.
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- Author
- Lu, H. L. ;Scarel, G. ;Lamagna, L. ;Fanciulli, M. ;Ding, Shi-Jin ;Zhang, David Wei
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 2008
- Field
- Engineering (Physical Sciences)