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About this Engineering article
Chemical Vapor Deposition of Strontium Ruthenate Thin Films from Bis(2, 4-Dimethylpentadienyl) Ruthenium and Bis(Tetramethylheptanedionato) Strontium by Breitkopf, Richard; Meda, Lamartine J.; Haas, Terry; Kirss, Rein U. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Breitkopf, Richard; Meda, Lamartine J.; Haas, Terry; Kirss, Rein U.
- Publisher
- Cambridge University Press; Cambridge University Press (Materials Research Society); Cambridge University Press (CUP) (ISSN 0272-9172)
- Published
- 1997
- Field
- Engineering (Physical Sciences)
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