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About this Engineering article
Controlled III–V semiconductor cluster nucleation and epitaxial growth via electron-beam lithography by Sleight, J. W.; Welser, R. E.; Guido, L. J.; Amman, M.; Reed, M. A. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Sleight, J. W.; Welser, R. E.; Guido, L. J.; Amman, M.; Reed, M. A.
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 1995
- Language
- EN
- Field
- Engineering (Physical Sciences)
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