About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Alternative Lithographic Technologies IV - Design of a high positioning contact probe for plasmonic lithography by Jang, Jinhee; Kim, Yongwoo; Kim, Seok; Jung, Howon; Hahn, Jae W.; Tong, William M. is a scholarly article available to read on EtoBox.

Author

Jang, Jinhee; Kim, Yongwoo; Kim, Seok; Jung, Howon; Hahn, Jae W.; Tong, William M.

Publisher

SPIE

Published

2012