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About this Engineering article
Submillisecond post-exposure bake of chemically amplified resists by CO[sub 2] laser spike annealing by J. Sha; B. Jung; M. O. Thompson; C. K. Ober; M. Chandhok; T. R. Younkin is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- J. Sha; B. Jung; M. O. Thompson; C. K. Ober; M. Chandhok; T. R. Younkin
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-211X)
- Published
- 2009
- Language
- EN
- Field
- Engineering (Physical Sciences)
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