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POLYMER MATERIALS FOR ELECTRONIC APPLCATIONS ACS SYMPOSIUM SERIES 184 by E. D. FEIT; C. W. WILKINS; E. D. ROBERTS; LARRY STILLWAGON; E. REICHMANIS; F. J. PURCELL; E. RUSSAVAGE; J. N. HELBERT; M. A. SCHMIDT; S. A. MacDONALD; C. G. WILLSON; E. M. ENGLER; Y. TOMKIEWICZ; J. D. KUPTSIS; R. G. SCHAD; V. V. PATEL; M. HATZAKIS; GAY SAMUELSON; Y. K. LEE; J. D. CRAIG; ATSUSHI SAIKI; KIICHIRO MUKAI; SEIKI HARADA; YASUO MIYADERA; A. M. WILSON; D. LAKS; S. M. DAVIS; GEORGE A. BROWN; CHING-PING WONG; JON F. GEIBEL; W. A. ROMANCHICK; J. F. GEIBEL; R. M. LUM; L. G. FEINSTEIN; R. S. POTEMBER; T. O. POEHLER is a book available to read on EtoBox.

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x, 256 pages : 24 cm Includes bibliographical references and index A sensitive positive-working cross-linked methacrylate electron resist / E.D. Roberts -- Radiation degradation and film solubility rates of poly(butene-1-sulfone) / Larry Stillwagon -- Poly(methyl methacrylate-co-3-oximino-2-butanone methacrylate-co-methacrylonitrile) : a deep-UV photoresist / E. Reichmanis and C.W. Wilkins, Jr. -- Compositional analysis of a terpolymer photoresist by raman spectroscopy / F.J. Purcell, E. Russavage, E. Reichmanis, and C.W. Wilkins, Jr. -- Effect of composition on resist dry-etching susceptibility : vinyl polymers and photoresists / J.N. Helbert and M.A. Schmidt -- Poly(N-alkyl-o-nitroamides) : a new class of thermally stable, photosensitive polymers / S.A. MacDonald and C.G. Willson -- A new approach to high-resolution lithography based on conducting organic charge transfer salts / E.M. Engler, Y. Tomkiewicz, J.D. Kuptsis, R.G. Schad, V.V. Patel, and M. Hatzakis -- Polyimide for multilevel very large-scale integration (VLSI) / Gay Samuelson -- Polyimide coatings for microelectronic applications / Y.K. Lee and J.D. Craig -- Development of polyimide isoindoloquinazolinedione in multil

Author

E. D. FEIT; C. W. WILKINS; E. D. ROBERTS; LARRY STILLWAGON; E. REICHMANIS; F. J. PURCELL; E. RUSSAVAGE; J. N. HELBERT; M. A. SCHMIDT; S. A. MacDONALD; C. G. WILLSON; E. M. ENGLER; Y. TOMKIEWICZ; J. D. KUPTSIS; R. G. SCHAD; V. V. PATEL; M. HATZAKIS; GAY SAMUELSON; Y. K. LEE; J. D. CRAIG; ATSUSHI SAIKI; KIICHIRO MUKAI; SEIKI HARADA; YASUO MIYADERA; A. M. WILSON; D. LAKS; S. M. DAVIS; GEORGE A. BROWN; CHING-PING WONG; JON F. GEIBEL; W. A. ROMANCHICK; J. F. GEIBEL; R. M. LUM; L. G. FEINSTEIN; R. S. POTEMBER; T. O. POEHLER

Publisher

AMERICAN CHEMICAL SOCIETY WASHINGTON,D.C. 1982

Published

1982

Language

EN

ISBN

9780841208773

Subjects

Engineering, Stem