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About this Engineering article
Ozone-Based Atomic Layer Deposition of Al 2 O 3 from Dimethylaluminum Chloride and Its Impact on Silicon Surface Passivation by Bao, Yameng; Laitinen, Mikko; Sajavaara, Timo; Savin, Hele is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Bao, Yameng; Laitinen, Mikko; Sajavaara, Timo; Savin, Hele
- Publisher
- Wiley (John Wiley & Sons); Wiley-VCH Verlag; Wiley (ISSN 2199-160X)
- Published
- 2017
- Language
- EN
- Field
- Engineering (Physical Sciences)