About this scholarly article

International Technical Digest on Electron Devices Meeting - Physical model for the diffusion of ion implanted boron and BF/sub 2/ during rapid thermal annealing by Kinoshita, ; Dim-Lee Kwong, is a scholarly article available to read on EtoBox.

Author

Kinoshita, ; Dim-Lee Kwong,

Publisher

IEEE

Published

1992

Language

EN