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About this Engineering article
Use of Tannic Acid for Fabrication of Nickel Films on Photoresists by Aerosol Deposition of Electroless Nickel by Sun, P.C.; Huang, C.H.; Shu, W.Y.; Wu, H.M. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Sun, P.C.; Huang, C.H.; Shu, W.Y.; Wu, H.M.
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0026-0576)
- Published
- 2001
- Field
- Engineering (Physical Sciences)
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