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About this Engineering article
Enhanced etching of silicon in CF4-O2-N2 plasma by Premachandran, V. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Premachandran, V.
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 1990
- Field
- Engineering (Physical Sciences)