About this scholarly article

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - CD performance evaluation according to advanced marking parameter by Yoon, Suk-Ky; Hosono, Kunihiro; Kim, Seung-Yun; Yeon, Kyoeong-Mee; Lim, Chan; Choi, Sung-Jin; Kim, Lee-Ju; Cho, Young-Rok; Kim, Hong-Seok is a scholarly article available to read on EtoBox.

Author

Yoon, Suk-Ky; Hosono, Kunihiro; Kim, Seung-Yun; Yeon, Kyoeong-Mee; Lim, Chan; Choi, Sung-Jin; Kim, Lee-Ju; Cho, Young-Rok; Kim, Hong-Seok

Publisher

SPIE

Published

2009

Language

EN